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Lasers for Microelectronics Applications    (SE-Version)  

THE ULTIMATE IN EXCIMER LASER TECHNOLOGY

 Semiconductor processing, mask inspection, microlithography and metrology lasers are available which meet CE mark and SEMI S2 standards. All semiconductor excimer lasers use the latest total metal/ceramic technology for maximum laser lifetime with minimal service. SE-version excimer lasers feature clean room packaging, longer chamber lifetimes and longer gas lifetimes than standard excimer lasers.

SE-Version Features

bullet10 Billion pulse system lifetime
bulletGuaranteed <1% stability
bullet200 Million pulses on a single ArF 193nm gas fill
bulletHard anodize clean room package
bulletMeets SEMI S2 standards

The EX10SE Semiconductor Excimer Laser

SE Versions are available for EX10, EX50, EX100 and EX100H products.

                                                     EX10SE specifications

PARAMETER

F2

ArF

KrF

XeCl

XeF

Wavelength nm

157

193

248

308

351

Energy Max. mJ

3

20

35

15

15

Energy Control Range mJ

1-3

5-20

10-35

7-15

7-15

Max. Stabilized Energy 200Hz

2.5

15

30

15

12

Average power Max. W 300/600

0.6/1.2

4/7

6/12

3/6

3/6

Stability standard deviation

< 1% at max. repetition rate

Repetition Rate, Hz

300/600/1000

Dynamic gas lifetime

200E6

200E6

500E6

100E6

300E6

Static Gas Life to 50% energy

15 days

60 days

90 days

>1 Year

90 days

Pulse Length, ns

12-15

Beam Size, mm

5X 3

8 X 3

Divergence, mRad full angle

1 X 2

Cooling

Air

Optics Service 500E6 300E6 1000E6 100E6 300E6